Two-photon 3D lithography printing system FIRST-CLA at ETH Zurich
Description
Die FIRST-CLA-Plattform der ETH Zürich bittet um Angebote für den Kauf eines Zwei-Photonen-3D-Mikro- und Nanolithografiesystems. Das Gerät wird für folgende Zwecke eingesetzt: 1) 3D-Druck von Strukturen im Submikron- und Mikrometerbereich mit Nanometerauflösung und Nanometer-Oberflächenrauheit 2) 3D...
AI Summary
The procurement concerns the purchase of a two-photon 3D micro and nanolithography system for the FIRST-CLA-Platform at ETH Zürich. This system is intended for 3D printing of nano-resolution structures and smooth surfaces, operating on various substrates without the need for pre-treatment.
- Purchase of a two-photon 3D micro and nanolithography system.
- Applications: 3D printing of submicron and micrometric structures.
Risk overview
- Requisiti sproporzionati1
- Obbligo di consorzio o partnership1
- Assicurazioni con massimali elevati1
- Scadenze troppo strette1
- Requisiti linguistici restrittivi1
- Ostacoli generali per le PMI1
Change history(3)
- ——
- Critical—
- Minor—
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Red Flags
6 flags identified — Overall risk: high
Financial Requirements
Technical Specifications
Change History
3 changes detected (1 critical, 0 major)
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About the buyer
- Active now
- 1
- All time
- 18
- Last activity
- 9 days ago
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