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Thin Film Cluster Deposition System for Sputtering of Metals and Dielectrics

ETH Zürich - Abt. Procurement & Export Services Zurich Laboratory, optical and precision equipments (excl. glasses) award unknown
Procedure: unknown Order type: unknown SIMAP ID: f5338cbf First seen: 8 Apr 2026 Latest publication: 19 Nov 2025
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Description

Dünnschicht-Cluster-Beschichtungsanlage für das Sputtern von Metallen und Dielektrika Clusteranlage mit einer Schleuse und 4 Prozesskammern (PCs) für das DC- und RF-Sputtern von Dielektrika und Metallen auf Halbleiter- und anderen Substraten. Details entnehmen Sie bitte unserer Spezifikation.

AI Summary

The procurement concerns the purchase of a thin film coating system for sputtering metals and dielectrics. The system must include a load lock chamber and four process chambers, designed for DC and RF sputtering on semiconductor substrates and other materials. Specific technical details are provided...

  • Equipment for sputtering of metals and dielectrics.
  • Includes a load lock chamber and four process chambers.

Risk overview

  • Requisiti sproporzionati1
  • Referenze1
  • Certificazioni1
  • Assicurazioni1
  • Scadenze1
  • Requisiti linguistici1
  • Obbligo di consorzio1

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Red Flags

7 flags identified — Overall risk: high

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Technical Specifications

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About the buyer

ETH Zürich - Abt. Procurement & Export Services
Zurich
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2
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5 days ago

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